The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2005
Filed:
Jul. 12, 2001
Arpan P. Mahorowala, Bronxville, NY (US);
Maheswaran Surendra, Croton-on-Hudson, NY (US);
Jung H. Yoon, Poughkeepsie, NY (US);
Ying Zhang, Yorktown Heights, NY (US);
Arpan P. Mahorowala, Bronxville, NY (US);
Maheswaran Surendra, Croton-on-Hudson, NY (US);
Jung H. Yoon, Poughkeepsie, NY (US);
Ying Zhang, Yorktown Heights, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The invention relates generally to lithographic patterning of very small features. In particular, the invention relates generally to patterning of semiconductor circuit features smaller than lithographically defined using either conventional optical lithography or next generation lithography techniques. The invention relates more particularly, but not by way of limitation, to lateral trimming of photoresist images.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile