The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2005

Filed:

Aug. 08, 2003
Applicants:

Brian K. Kirkpatrick, Allen, TX (US);

Mercer Brugler, Flower Mound, TX (US);

Eddie Breashears, Lucas, TX (US);

Jon Holt, Plano, TX (US);

Corbett Zabierek, Dallas, TX (US);

Rajesh Khamankar, Coppell, TX (US);

Inventors:

Brian K. Kirkpatrick, Allen, TX (US);

Mercer Brugler, Flower Mound, TX (US);

Eddie Breashears, Lucas, TX (US);

Jon Holt, Plano, TX (US);

Corbett Zabierek, Dallas, TX (US);

Rajesh Khamankar, Coppell, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01I021/46 ; H01I021/78 ; H01I021/326 ; H01L021/479 ;
U.S. Cl.
CPC ...
Abstract

The present invention provides a method for improving a physical property of a substrate, a method for manufacturing an integrated circuit, and an integrated circuit manufactured using the aforementioned method. In one aspect of the invention, the method for improving a physical property of a substrate includes subjecting the substrate to effects of a plasma process, wherein the substrate has a physical property defect value associated therewith subsequent to the plasma process. The method further includes exposing the substrate to an ultraviolet (UV) energy sourceto improve the physical property defect value.


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