The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2005
Filed:
Aug. 02, 2000
Applicant:
Gary Powell, Petaluma, CA (US);
Inventor:
Gary Powell, Petaluma, CA (US);
Assignee:
Lightwind Corporation, San Francisco, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J003/30 ;
U.S. Cl.
CPC ...
Abstract
The present invention relates to an apparatus and method for forming a plasma in the exhaust line of a primary process reactor. The plasma is generated in an inductive source () to examine the chemical concentrations of the waste or exhaust gas in vacuum lines that are below atmospheric pressure. The optical radiation emitted by the plasma is analyzed by an optical spectrometer () and the resulting information is used to diagnose, monitor, or control operating states in the main vacuum vessel.
Published as: