The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 15, 2005

Filed:

Jul. 03, 2002
Applicants:

Nobuaki Ogushi, Utsunomiya, JP;

Yutaka Watanabe, Tochigi-ken, JP;

Akira Miyake, Utsunomiya, JP;

Inventors:

Nobuaki Ogushi, Utsunomiya, JP;

Yutaka Watanabe, Tochigi-ken, JP;

Akira Miyake, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B027/52 ; G03B027/72 ; G21K005/00 ; G21K001/04 ;
U.S. Cl.
CPC ...
Abstract

A debris removing system prevents debris from being scattered from an X-ray source. The debris removing system includes an attracting unit, disposed between a light emission point of the X-ray source and the optical system, for attracting debris. The attracting unit has an attracting surface parallel or approximately parallel to an axis passing through the light emission point. The debris removing system further includes a rotation unit for rotating the attracting unit about the axis. This debris removing system assures a superior debris removing effect and a good EUV light utilization efficiency, being compatible with each other.


Find Patent Forward Citations

Loading…