The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2005
Filed:
Feb. 11, 2002
Valery V. Alekseev, Moscow, RU;
Vsevolod V. Zelenkov, Moscow, RU;
Mark M. Krivoruchko, Zelenograd, RU;
John E. Keem, Bloomfield Hills, MI (US);
Valery V. Alekseev, Moscow, RU;
Vsevolod V. Zelenkov, Moscow, RU;
Mark M. Krivoruchko, Zelenograd, RU;
John E. Keem, Bloomfield Hills, MI (US);
Veeco Instruments, Inc., Woodbury, NY (US);
Abstract
A closed loop exit hole is formed in a magnetically permeable end wall () of an enclosure () of a closed electron drift ion source. Parts of this end wall separated by the exit hole serve as pole pieces (and) of the magnetic system and define the first pole gap. The magnetic system includes pole pieces (and), which define the second pole gap made in the form of a closed loop exit hole and arranged along the direction of ion emission. Magnetomotive force sources (and) are located in space between two groups of magnetic terminals. The ratio of width of each pole gap and distance between pole pieces of the first (and) and second (and) magnetic gaps along the direction of ion emission is not less than 0.05. The invention allows the intensity of the generated ion beam and the energy of ions to be increased, and this is provided by the homogeneous distribution of ion current density across the ion beam section.