The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2005
Filed:
Dec. 24, 2002
Applicants:
Kunal Taravade, Portland, OR (US);
Neal Callan, Lake Oswego, OR (US);
Inventors:
Kunal Taravade, Portland, OR (US);
Neal Callan, Lake Oswego, OR (US);
Assignee:
LSI Logic Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F009/00 ;
U.S. Cl.
CPC ...
Abstract
An attenuated phase shift mask is formed using a non-linear optical material for both fiducial features and pattern features. The non-linear optical material selected has predetermined transmission at the actinic exposure wavelength and a smaller transmission at the fiducial recognition wavelengths.