The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2005
Filed:
Dec. 20, 2002
Applicants:
Hsiao-hui Chen, Hsinchu, TW;
Cheng-hsiung Kuo, Tainan, TW;
Inventors:
Hsiao-Hui Chen, Hsinchu, TW;
Cheng-Hsiung Kuo, Tainan, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F017/50 ;
U.S. Cl.
CPC ...
Abstract
A method for revising a patterned conductor layer and a system for revising the patterned conductor layer employ an unoccupied equivalent wiring location. The unoccupied equivalent wiring location is provided in each of a series of wiring layout records. At least one optional wiring pattern may be formed in the unoccupied equivalent wiring location. The method and system provide for extending to all of the series of wiring layout records an optional wiring pattern and an interconnect option formed within a single one of the series of wiring layout records.