The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2005
Filed:
Oct. 08, 2003
Ronald A. Palfenier, Oregon City, OR (US);
Patrick J. Nystrom, Gresham, OR (US);
Ronald A. Palfenier, Oregon City, OR (US);
Patrick J. Nystrom, Gresham, OR (US);
Exactus, Inc., Boca Raton, FL (US);
Abstract
A radiometric system () typically used in semiconductor wafer processing has reduced optical losses, improved wavelength selectivity, improved signal to noise, and improved signal processing to achieve wafer temperature measurements from about 10° C. to 4,000° C. A YAG rod collection optic () directly couples specimen radiation () to a filter () and photo detector (). The filter determines which radiation wavelengths are measured, and optionally includes a hot/cold mirror surface () for reflecting undesired radiation wavelengths back to the specimen. The detector is formed from doped GaAlAs having a peaked response near 900 nm. A signal processor () converts the signal into a temperature reading.