The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2005
Filed:
Mar. 22, 2002
Katsunori Ichiki, Kanagawa, JP;
Kazuo Yamauchi, Kanagawa, JP;
Hirokuni Hiyama, Kanagawa, JP;
Seiji Samukawa, Miyagi, JP;
Katsunori Ichiki, Kanagawa, JP;
Kazuo Yamauchi, Kanagawa, JP;
Hirokuni Hiyama, Kanagawa, JP;
Seiji Samukawa, Miyagi, JP;
Ebara Corporation, Ohta-ku, JP;
Abstract
A neutral particle beam processing apparatus comprises a process gas inlet port () for introducing a process gas into a vacuum chamber (), a plasma generating chamber () for generating positive ions and electrons from the introduced process gas, and a negative ion generating chamber () for attaching electrons generated in the plasma generating chamber to the residual gas to generate negative ions. The neutral particle beam processing apparatus further comprises an ion extracting portion () for extracting the positive ions or the negative ions and accelerating the positive ions or the negative ions in a predetermined direction, and a neutralizing chamber () for neutralizing an ion beam generated by the ion extracting portion () to generate a neutral particle beam. The neutral particle beam generated in the neutralizing chamber () is applied to a workpiece (X).