The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2005

Filed:

Mar. 22, 2002
Applicants:

Katsunori Ichiki, Kanagawa, JP;

Kazuo Yamauchi, Kanagawa, JP;

Hirokuni Hiyama, Kanagawa, JP;

Seiji Samukawa, Miyagi, JP;

Inventors:

Katsunori Ichiki, Kanagawa, JP;

Kazuo Yamauchi, Kanagawa, JP;

Hirokuni Hiyama, Kanagawa, JP;

Seiji Samukawa, Miyagi, JP;

Assignee:

Ebara Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L021/306 ;
U.S. Cl.
CPC ...
Abstract

A neutral particle beam processing apparatus comprises a plasma generator for generating positive ions and/or negative ions in a plasma, a pair of electrodes () involving the plasma generated by the plasma generator therebetween, and a power supply () for applying a voltage between the pair of electrodes (). The pair of electrodes () accelerate the positive ions and/or the negative ions generated by the plasma generator. The positive ions and/or the negative ions are neutralized and converted into neutral particles while being drifted in the plasma between the pair of electrodes () toward a workpiece (X). The accelerated neutral particles pass through one of the electrodes () and are applied to the workpiece (X).


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