The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2005
Filed:
Mar. 20, 2002
Anthony Zampini, Westborough, MA (US);
Charles R. Szmanda, Westborough, MA (US);
Gary N. Taylor, Northboro, MA (US);
James F. Cameron, Cambridge, MA (US);
Gerhard Pohlers, Newton, MA (US);
Anthony Zampini, Westborough, MA (US);
Charles R. Szmanda, Westborough, MA (US);
Gary N. Taylor, Northboro, MA (US);
James F. Cameron, Cambridge, MA (US);
Gerhard Pohlers, Newton, MA (US);
Shipley Company, L.L.C., Marlborough, MA (US);
Abstract
New photoresists are provided that are suitable for short wavelength imaging, including sub-200 nm such as 157 nm. In one aspect, resists of the invention comprise a fluorine-containing polymer, a photoactive component, and one or more additional components of an amine or other basic composition, a dissolution inhibitor compound, a surfactant or leveling agent, or a plasticizer material. In another aspect, resists of the invention contain a fluorine-containing resin and one or more photoacid generator compounds, particularly non-aromatic onium salts and imidosulfonates, and other non-ionic photoacid generator compounds.