The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2005
Filed:
Jan. 16, 2002
Chul-hwan Choi, Seoul, KR;
Jin-ho Jeon, Seoul, KR;
Yong-gab Kim, Suwon, KR;
Jong-seung Yi, Suwon, KR;
Min-woo Lee, Seoul, KR;
Kyung-tae Kim, Suwon, KR;
Chan-hyung Cho, Whasong-gun, KR;
Chul-Hwan Choi, Seoul, KR;
Jin-Ho Jeon, Seoul, KR;
Yong-Gab Kim, Suwon, KR;
Jong-Seung Yi, Suwon, KR;
Min-Woo Lee, Seoul, KR;
Kyung-Tae Kim, Suwon, KR;
Chan-Hyung Cho, Whasong-gun, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A residual gas removing device for a gas supply apparatus in a semiconductor fabricating facility, includes a low stress valve disposed between a mass flow controller and a chamber. The low stress valve alternately supplies or cuts off a gas from the mass flow controller to the chamber. A WF6 gas removing apparatus is in flow communication with a gas inlet line of the low stress valve to remove a residual WF6 gas in the gas inlet line, before proceeding with a subsequent deposition step.