The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2005

Filed:

Jan. 24, 2002
Applicants:

Kwong Hon Wong, Wappingers Falls, NY (US);

Karl E. Boggs, Hopewell Junction, NY (US);

Raphael Mitchell, Pine Bush, NY (US);

Uldis A. Ziemins, Poughkeepsie, NY (US);

Inventors:

Kwong Hon Wong, Wappingers Falls, NY (US);

Karl E. Boggs, Hopewell Junction, NY (US);

Raphael Mitchell, Pine Bush, NY (US);

Uldis A. Ziemins, Poughkeepsie, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C25F005/00 ;
U.S. Cl.
CPC ...
Abstract

A method and structure polishes and cleans silicon wafers by mixing a marker with a slurry to form a slurry mixture, performs chemical mechanical polishing on a silicon wafer using the slurry mixture, rinses the slurry mixture from the silicon wafer, checks the silicon wafer for marker residue, and repeats the rinsing process if the checking process detects the marker residue on the wafer.


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