The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2005
Filed:
May. 28, 2002
Henry Shields, San Pedro, CA (US);
Henry Shields, San Pedro, CA (US);
Northrop Grumman Corporation, Los Angeles, CA (US);
Abstract
A laser-plasma, EUV radiation source () that controls the target droplet delivery rate so that successive target droplets () are not affected by the ionization of a preceding target droplet. A source nozzle () of the source () has an orifice () of a predetermined size that allows the droplets () to be emitted at a rate set by the target materials natural Rayleigh instability break-up frequency as generated by a piezoelectric transducer (). The rate of the droplet generation is determined by these factors in connection with the pulse frequency of the excitation laser () so that buffer droplets () are delivered between the target droplets (). The buffer droplets () act to absorb radiation generated from the ionized target droplet () so that the next target droplet () is not affected.