The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 15, 2005

Filed:

Jul. 16, 2003
Applicants:

Dirk Preikszas, Oberkochen, DE;

Michael Steigerwald, Aalen, DE;

Peter Hoffrogge, Oberkochen, DE;

Peter Gnauck, Reutlingen, DE;

Inventors:

Dirk Preikszas, Oberkochen, DE;

Michael Steigerwald, Aalen, DE;

Peter Hoffrogge, Oberkochen, DE;

Peter Gnauck, Reutlingen, DE;

Assignee:

Carl Zeiss NTS GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J037/145 ;
U.S. Cl.
CPC ...
Abstract

An objective lens with magnetic and electrostatic focusing for an electron microscopy system is provided whose at least partially conical outer shape allows orienting an object to be imaged at a large angle range in respect of an electron beam, said objective lens exhibiting, at the same time, good optical parameters. This is enabled by a specific geometry of the lens elements. Furthermore, an examination for the simultaneous imaging and processing of an object is proposed which comprises, besides an electron microscopy system with the above-mentioned objective lens, also an ion beam processing system and an object support.


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