The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2005
Filed:
Apr. 02, 2001
Atsushi Iwasaki, Tokyo, JP;
Bruno Ghyselen, Seyssinet, FR;
Atsushi Iwasaki, Tokyo, JP;
Bruno Ghyselen, Seyssinet, FR;
S.O.I. Tec Silicon on Insulator Technologies S.A., Bernin, FR;
Abstract
The invention concerns a method for making substrates, in particular for optics, electronics or optoelectronics. The method includes an operation which consists in implanting () atomic species beneath the surface of a material in the form of a cylindrical ingot (), at a depth of implantation distributed about a certain value by bombardment of the atomic species on a zone of the ingot () cylindrical surface, and an operation which consists in removing (), at a separation depth located proximate to the depth of implantation, the layer () of material located between the surface and the separation depth, to remove the layer () from the rest of the cylindrical ingot ().