The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 15, 2005
Filed:
Apr. 26, 2002
Applicants:
John Scanlan, Waterford, IE;
Kevin O'leary, Lucan, IE;
Inventors:
John Scanlan, Waterford, IE;
Kevin O'Leary, Lucan, IE;
Assignee:
Scientific Systems Research Limited, Dublin, IE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B007/04 ;
U.S. Cl.
CPC ...
Abstract
A method for determining optimum plasma chamber cleaning cycles based on an electrical precursor signal. Polymer build up on the interior wall of plasma chamberduring normal production runs is monitored by observing the phase of the fundamental RF signal on a pre-selected baseline process. At a predetermined level of this signal, the chamber processing is stopped and the chamber walls are cleaned.
Scanlan, John. (2005). Plasma chamber cleaning (U.S. Patent No. 6855209). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6855209
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile