The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6852601 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 08, 2005

Filed:

Mar. 27, 2002
Applicants:

Seiichi Yoshida, Sagamihara, JP;

Takashi Tanahashi, Sagamihara, JP;

Akira Onodera, Fuchu, JP;

Motoki Akimoto, Sagamihara, JP;

Inventors:

Seiichi Yoshida, Sagamihara, JP;

Takashi Tanahashi, Sagamihara, JP;

Akira Onodera, Fuchu, JP;

Motoki Akimoto, Sagamihara, JP;

Assignee:

Tokyo Electron Limited, Tokyo-To, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L021/336 ;
U.S. Cl.
CPC ...
Abstract

When carrying workpieces from a loading area in which the workpieces are handled into a heat treatment furnace to make the workpieces subjected to a heat treatment process using a predetermined process gas, the loading area is evacuated and controlled at a predetermined low negative pressure. An exhaust for evacuating the loading area is connected to the loading area, and a controller controls the exhaust so that the loading area is maintained at the predetermined low negative pressure. A specific gas and particles contained in a gas discharged from the loading area are removed by filters.


Find Patent Forward Citations

Yoshida, Seiichi. (2005). Heat treatment method that includes a low negative pressure (U.S. Patent No. 6852601). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6852601

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