The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
May. 27, 2003
Hidemitsu Naya, Hitachi, JP;
Rikio Tomiyoshi, Mito, JP;
Shigeo Moriyama, Tama, JP;
Mutsumi Kikuchi, Hitachi, JP;
Kotaro Shimamura, Hitachinaka, JP;
Hidemitsu Naya, Hitachi, JP;
Rikio Tomiyoshi, Mito, JP;
Shigeo Moriyama, Tama, JP;
Mutsumi Kikuchi, Hitachi, JP;
Kotaro Shimamura, Hitachinaka, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A semiconductor production system has a semiconductor manufacturing apparatus having an exposure unit, a control unit for controlling the exposure unit and a storage device; a semiconductor inspection apparatus having an observation unit, a control unit for controlling the observation unit and a storage device; and a storage device commonly used by the semiconductor manufacturing apparatus and the semiconductor inspection apparatus. The manufacturing apparatus, the inspection apparatus and the commonly used storage device are interconnected via a storage area network. With the semiconductor manufacturing apparatus and the storage device linked together via the storage area network, a large volume of image data or design data can be communicated at high speed, thus improving the system throughput.