The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Apr. 07, 2003
George G. Barclay, Jefferson, MA (US);
Stefan J. Caporale, Worcester, MA (US);
Wang Yueh, Shrewsbury, MA (US);
Zhibiao Mao, Shrewsbury, MA (US);
Joseph Mattia, Framingham, MA (US);
George G. Barclay, Jefferson, MA (US);
Stefan J. Caporale, Worcester, MA (US);
Wang Yueh, Shrewsbury, MA (US);
Zhibiao Mao, Shrewsbury, MA (US);
Joseph Mattia, Framingham, MA (US);
Shipley Company, L.L.C., Marlborough, MA (US);
Abstract
The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.