The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 01, 2005
Filed:
Apr. 09, 2003
Applicants:
David J. Duquette, Loundonville, NY (US);
Lisa J. Loparco, Mechanicville, NY (US);
Inventors:
David J. Duquette, Loundonville, NY (US);
Lisa J. Loparco, Mechanicville, NY (US);
Assignee:
Rensselaer Polytechnic Institute, Troy, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25F 302 ;
U.S. Cl.
CPC ...
Abstract
One aspect is directed to an improved method for polishing an integrated circuit. According to one aspect, metal features deposited on an integrated circuit are polished using electropolishing techniques. Because electropolishing is used, polishing avoids removal of softer insulating materials of the integrated circuit.