The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 25, 2005

Filed:

Aug. 02, 2002
Applicant:

Nicholas G. Doe, San Ramon, CA (US);

Inventor:

Nicholas G. Doe, San Ramon, CA (US);

Assignee:

Zygo Corporation, Middlefield, CT (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 1102 ;
U.S. Cl.
CPC ...
Abstract

A method for estimating a property of a selected feature on a photolithographic mask includes providing a model of an image-acquisition system. The model includes information indicative of the characteristics of the image-acquisition system. The image-acquisition system is used to obtain a measured signal representative of the selected feature. On the basis of the measured signal, and the information provided by the model, a value of the property is estimated for the selected feature.


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