The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2005
Filed:
Aug. 13, 2002
Applicants:
Marco Wieland, Delft, NL;
Bert Jan Kampherbeek, Delft, NL;
Pieter Kruit, Delft, NL;
Inventors:
Assignee:
Mapper Lithography IP B.V., Delft, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3700 ;
U.S. Cl.
CPC ...
Abstract
A lithography system comprising a converter element () for receiving light and converting said light in a plurality of electron beams () to be directed towards and focused on a substrate () to be processed, said plurality of electron beams () being used to define a pattern in a resist layer () on said substrate (), wherein said lithography system is provided with a protective foil with holes at the positions of the electron beams () being arranged to protect, in use, said converter element () from contamination with material from the resist layer ().