The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 18, 2005

Filed:

Sep. 12, 2002
Applicants:

Noboru Oshima, Tokyo, JP;

Yooichiroh Maruyama, Tokyo, JP;

Michitaka Kaizu, Tokyo, JP;

Katsutoshi Sawada, Tokyo, JP;

Toshihiro Hayashi, Tokyo, JP;

Kenzo Ohkita, Tokyo, JP;

Inventors:

Noboru Oshima, Tokyo, JP;

Yooichiroh Maruyama, Tokyo, JP;

Michitaka Kaizu, Tokyo, JP;

Katsutoshi Sawada, Tokyo, JP;

Toshihiro Hayashi, Tokyo, JP;

Kenzo Ohkita, Tokyo, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 444 ; C08L 551 ;
U.S. Cl.
CPC ...
Abstract

The present invention provides a cyclic olefin addition copolymer which has a reactive silyl group having a specific structure, excels in optical transparency, heat resistance, and adhesion, and is capable of producing a crosslinked product having improved dimensional stability, solvent resistance, and chemical resistance. The present invention also provides a process for producing the cyclic olefin addition copolymer, a crosslinking composition, a crosslinked product and a process for producing the same, and an optically transparent material (transparent resin film) comprising the cyclic olefin addition copolymer. The optically transparent material excels in optical transparency and heat resistance, exhibits improved dimensional stability, adhesion, solvent resistance, and chemical resistance, and is capable of improving fragility and preventing occurrence of cracks in the film.


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