The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 18, 2005
Filed:
Jan. 18, 2000
Peter Ekberg, Lindingo, SE;
Johan Åman, Täby, SE;
Peter Ekberg, Lindingo, SE;
Johan Åman, Täby, SE;
Micronic Laser Systems AB, Taby, SE;
Abstract
The present invention relates to a method and a system for producing large area display panels with improved precision. The system according to the invention comprises a first mask producing means () for producing a mask with a predetermined pattern according to input data and microlithographic exposing means () for exposing a photosensitive substrate with light and with use of a mask to impose the pattern of the mask on the substrate, whereby said substrate has a layer being sensitive to said light. Further, the system comprises measuring means () for measuring the pattern on the substrate and detecting deviations relative to the intended pattern as given by the input data, and second mask producing means () for producing a second mask according to second input data, and being controllable according to said measurement, to modify the pattern on the mask to compensate for the measured deviations, and thus compensate for production distortions.