The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Feb. 08, 2001
Jinlian HU, Kowloon, HK;
Binjie Xin, Kowloon, HK;
Jinlian Hu, Kowloon, HK;
Binjie Xin, Kowloon, HK;
The Hong Kong Polytechnic University, Kowloon, HK;
Abstract
A method of three dimensional measurement, evaluation, and grading system for fabric/textile structure/garment appearance, based an values P and Q, is carried out using a fixed digital camera positioned above a piece of the fabric, shining at least two different parallel light beams from inclined directions onto the surface of the fabric and capturing different reflected images of the surface with the camera. The captured images are analysed to derive certain parameters relevant to the appearance. In particular, values of P+Q may be used in a grading evaluation, where P and Q are summations of the surface gradients for a plurality of evenly distributed points in an x direction and in a y direction of the surface, respectively.