The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Dec. 06, 2000
Applicants:
Giora Dishon, Jerusalem, IL;
Moshe Finarov, Rehovot, IL;
Yoel Cohen, Ness Ziona, IL;
Zvi Nirel, Mevasseret Zion, IL;
Inventors:
Giora Dishon, Jerusalem, IL;
Moshe Finarov, Rehovot, IL;
Yoel Cohen, Ness Ziona, IL;
Zvi Nirel, Mevasseret Zion, IL;
Assignee:
Nova Measuring Instruments Ltd., Rehovot, IL;
Primary Examiner:
Int. Cl.
CPC ...
G03B 2732 ; G03D 500 ; G01B 1100 ; G01N 2100 ;
U.S. Cl.
CPC ...
Abstract
A method for in process monitoring of the parameters of a substrate undergoing a processing within a photolithography tools arrangement which includes substrate loading and unloading stations, and substrate coating, exposure and developing stations. The method includes the step of supplying the substrate after being developed to a monitoring station and analyzing the monitoring data to estimate the photolithography process to be used for controlling thereof.