The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 11, 2005
Filed:
Jun. 30, 2003
Yuh-hwa Chang, Taipei, TW;
Jiann-tyng Tzeng, Yi Lan, TW;
Yuh-Hwa Chang, Taipei, TW;
Jiann-Tyng Tzeng, Yi Lan, TW;
Taiwan Semiconductor Manufacturing Co. LTD, Hsinchu, TW;
Abstract
A method for manufacturing reflective spatial light modulator mirror devices is disclosed. In the method, a portion of a mirror layer and a first sacrificial layer beneath the portion of the mirror layer are removed simultaneously to expose the substrate while defining a pattern of the mirror layer. Then, a second sacrificial layer is deposited conformally, and substrate contact openings and a mirror layer contact opening are defined in the second sacrificial layer at the same time. Subsequently, a support material layer is deposited conformally and etched back, so as to form supporting posts of the mirror layer in the substrate contact openings. Before the support material layer is etched back, the substrate contact openings can be filled with a photoresist material first, so as to maintain the support material layer in the substrate contact openings and increase the structural intensity of the supporting posts.