The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 04, 2005
Filed:
Sep. 26, 2003
Masatsugu Arai, Chiyoda, JP;
Ryujiro Udo, Ushiku, JP;
Naoyuki Tamura, Kudamatsu, JP;
Masanori Kadotani, Kudamatsu, JP;
Motohiko Yoshigai, Hikari, JP;
Masatsugu Arai, Chiyoda, JP;
Ryujiro Udo, Ushiku, JP;
Naoyuki Tamura, Kudamatsu, JP;
Masanori Kadotani, Kudamatsu, JP;
Motohiko Yoshigai, Hikari, JP;
Hitachi, Ltd., Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A plasma processing apparatus provided with a holding stage of a system in which a temperature of an electrode block is controlled so as to control the temperature of a semiconductor wafer. The electrode block is provided with at least first and second independent temperature controllers on inner and outer sides thereof, and a slit for suppressing heat transfer is provided in the electrode block between the first and second temperature controllers.