The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 04, 2005

Filed:

Aug. 22, 2003
Applicants:

Yasufumi Koyama, Kyoto, JP;

Kenji Kamei, Kyoto, JP;

Toru Kitamoto, Kyoto, JP;

Kenji Hashinoki, Kyoto, JP;

Satoshi Yamamoto, Kyoto, JP;

Toshiaki Dainin, Kyoto, JP;

Inventors:

Yasufumi Koyama, Kyoto, JP;

Kenji Kamei, Kyoto, JP;

Toru Kitamoto, Kyoto, JP;

Kenji Hashinoki, Kyoto, JP;

Satoshi Yamamoto, Kyoto, JP;

Toshiaki Dainin, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03D 500 ; B65G 4907 ; B05C 1300 ;
U.S. Cl.
CPC ...
Abstract

A substrate treating apparatus has an antireflection film forming block, a resist film forming block and a developing block arranged in juxtaposition, each of these blocks including treating modules and a single main transport mechanism. The main transport mechanism transports substrates within each block, and transfers the substrates between the blocks through inlet substrate rests and outlet substrate rests provided as separate components. This construction realizes improved throughput of the substrate treating apparatus.


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