The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2004
Filed:
Jul. 12, 2002
Applicant:
Inventor:
Fumio Hosokawa, Tokyo, JP;
Assignee:
Jeol Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 2/102 ;
U.S. Cl.
CPC ...
G02B 2/102 ;
Abstract
A spherical aberration corrector used in an electron microscope. The corrector has a spherical aberration correction optical system that permits the magnification to be varied. Rotational relation between two multipole elements within a plane perpendicular to the optical axis can be corrected without varying the phase angles of the multipole elements. A rotation-correcting lens is positioned within the focal plane of an electron trajectory formed between two axially symmetric lenses in the corrector to rotate electrons within a plane perpendicular to the optical axis.