The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 28, 2004
Filed:
Feb. 27, 2003
Applicant:
Inventors:
Annette Saenger, Dresden, DE;
Bernhard Sell, Portland, OR (US);
Harald Seidl, Feldkirchen, DE;
Thomas Hecht, Dresden, DE;
Martin Gutsche, Dorfen, DE;
Assignee:
Infineon Technologies AG, Munich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
The ALD process chamber has heating radiation sources and the process sequence includes rapid temperature changes on a substrate surface of a substrate arranged in the ALD process chamber. The temperature changes are controlled and the ALD and CVD processes are optimized by in situ temperature steps, for example in order to produce nanolaminates.
Quick Actions:
Saenger, Annette. (2004). Method and device for depositing thin layers via ald/cvd processes in combination with rapid thermal processes (U.S. Patent No. 6835417). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6835417
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile