The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 2004
Filed:
May. 07, 2002
Hideyuki Kazumi, Hitachi, JP;
Tsutomu Tetsuka, Ibaraki-ken, JP;
Ryoji Nishio, Mito, JP;
Masatsugu Arai, Kudamatsu, JP;
Ken Yoshioka, Hikari, JP;
Tsunehiko Tsubone, Hikari, JP;
Akira Doi, Ibaraki-ken, JP;
Manabu Edamura, Ibaraki-ken, JP;
Kenji Maeda, Matsudo, JP;
Saburo Kanai, Hikari, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A plasma processing apparatus includes a vacuum chamber having a structure that surrounds a space where plasma is generated, a sample stage disposed in the chamber on which a sample to be processed is placed and coil antenna providing an electric field to the space. The structure has a non-conductive member surrounding the space and a conductive member covering the non-conductive member, both of which are disposed between the antenna and the space. The conductive member is electrically floated at least when the plasma is generated.