The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2004
Filed:
Jan. 18, 2002
Applicant:
Inventors:
Sachio Uto, Yokohama, JP;
Minoru Yoshida, Yokohama, JP;
Toshihiko Nakata, Hiratsuka, JP;
Shunzi Maeda, Yokohama, JP;
Atsushi Shimoda, Hiratsuka, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/100 ; G01N 2/186 ;
U.S. Cl.
CPC ...
G01N 2/100 ; G01N 2/186 ;
Abstract
The present invention provides a pattern defect inspecting apparatus wherein an amount-of-light monitor unit detects a variation in the amount of ultraviolet laser light during inspection to thereby determine the presence or absence of an influence thereof exerted on the inspection and detects the prediction of the life of a light source and a malfunction thereof, and the interior of an optical system is cleaned up to thereby ensure the prolongation of the life of each optical part and long-term reliability thereof, and a method thereof.