The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6829047 B1

PDF
Full Text
Expired
Date of Patent:
Dec. 07, 2004

Filed:

Feb. 04, 2002
Applicant:
Inventors:

Tatsuya Fujii, Tokyo, JP;

Ayumu Onoyama, Tokyo, JP;

Koichi Sakurai, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 2/100 ;
U.S. Cl.
CPC ...
G01N 2/100 ;
Abstract

A defect detection system to check any defect in the pattern to be checked by comparing a pattern to be checked with a reference pattern includes an edge detection means for detecting a pattern edge of the pattern to be checked by scanning a substrate by laser beams and detecting reflected light thereof. After the relative position between the substrate and the imaging means is adjusted so that the pattern edge of the pattern to be checked is substantially aligned with one side of CCD pixels, an image of the pattern to be checked is picked up. Therefore, the defect detection system corrects misalignment less than one pixel between a pattern to be checked and a reference pattern to prevent occurrence of a false defect.


Find Patent Forward Citations

Fujii, Tatsuya. (2004). Defect detection system (U.S. Patent No. 6829047). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6829047

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