The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2004
Filed:
Apr. 01, 2003
Applicant:
Inventors:
Ronald N. Reece, Westwood, MA (US);
Michael A. Graf, Cambridge, MA (US);
Thomas Parrill, North Andover, MA (US);
Brian S. Freer, Medford, MA (US);
Assignee:
Axcelis Technologies, Inc., Beverly, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/100 ; G01N 2/300 ; G21K 5/10 ;
U.S. Cl.
CPC ...
G01N 2/100 ; G01N 2/300 ; G21K 5/10 ;
Abstract
The present invention facilitates semiconductor device fabrication by monitoring and correcting angular errors during ion implantation procedures via an incident ion beam angle detector. Additionally, the present invention facilitates semiconductor device fabrication by calibrating a process disk with respect to an incident ion beam without measuring implantation results on wafers prior to an ion implantation process.