The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2004
Filed:
Apr. 23, 2002
Shuji Nakao, Hyogo, JP;
Renesas Technology Corp., Tokyo, JP;
Abstract
The inventive pattern forming method for transferring a bright line pattern to a photoresist material with a photomask having the bright line pattern includes a step of transferring the bright line pattern of the photomask to the photoresist material by exposure with a light exposure of at least four times and not more than 10 times the light exposure photosensitizing the photoresist material and inverting solubility. Thus, excellent CD-focus characteristics are attained thereby obtaining a pattern forming method and a method of fabricating a device with small dimensional dispersion.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile