The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2004
Filed:
Apr. 23, 2002
Applicant:
Inventors:
Isao Nishimura, Tokyo, JP;
Nobuo Bessho, Tokyo, JP;
Atsushi Kumano, Tokyo, JP;
Tsutomu Shimokawa, Tokyo, JP;
Kenji Yamada, Kyoto, JP;
Assignee:
JSR Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 ; G03F 7/36 ; C08L 8/314 ; C08L / ; G02B 3/00 ;
U.S. Cl.
CPC ...
G03F 7/004 ; G03F 7/36 ; C08L 8/314 ; C08L / ; G02B 3/00 ;
Abstract
A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.