The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 07, 2004

Filed:

Mar. 24, 2003
Applicant:
Inventors:

Hiroyasu Nishida, Fukuoka-ken, JP;

Yoshinori Wakamiya, Fukuoka-ken, JP;

Michio Komatsu, Fukuoka-ken, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 4/702 ;
U.S. Cl.
CPC ...
B24B 4/702 ;
Abstract

In polishing particles each having a core-shell structure, a polishing rate can be controlled by adjusting a thickness and/or density of a shell portion. The polishing particles have the core-shell structure with an average diameter in the range from 5 to 300 nm, and the shell portion of the polishing particles includes silica with a thickness in the range from 1 to 50 nm. A density of the shell portion is in the from 1.6 to 2.2 g/cc, while the Na content of the shell portion is less than 10 ppm.


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