The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 07, 2004
Filed:
Apr. 19, 2002
David R. Williams, Fairport, NY (US);
William J. Vaughn, Rochester, NY (US);
Benjamin D. Singer, Pittsford, NY (US);
Heidi Hofer, Rochester, NY (US);
Geun-Young Yoon, Rochester, NY (US);
Pablo Artal, Murcia, ES;
Juan Luis Arag{dot over (o)}n, Murcia, ES;
Pedro Prieto, Murcia, ES;
Fernando Vargas, Murcia, ES;
University of Rochester, Rochester, NY (US);
Abstract
A wavefront aberration of an eye is determined, e.g., in real time. The eye is illuminated, and the light reflected from the retina is converted into spots with a device such as a Hartmann-Shack detector. The displacement of each spot from where it would be in the absence of aberration allows calculation of the aberration. Each spot is located by an iterative technique in which a corresponding centroid is located in a box drawn on the image data, a smaller box is defined around the centroid, the centroid is located in the smaller box, and so on. The wavefront aberration is calculated from the centroid locations by using a matrix in which unusable data can be eliminated simply by eliminating rows of the matrix. Aberrations for different pupil sizes are handled in data taken for a single pupil size by renormalization.