The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2004
Filed:
Dec. 07, 2001
Applicant:
Inventors:
Joachim Schroeder, Aalen, DE;
Gerald Richter, Aalen-Hofen, DE;
Dieter Schmerek, Aalen-Hofen, DE;
Uwe Schubert, Aalen, DE;
Maria Johanna Agnes Rubingh, Eindhoven, NL;
Willem van Schaik, GL's Hertogenbosch, NL;
Siebe Landheer, Eindhoven, NL;
Assignee:
Carl Zeiss SMT AG, , DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/752 ; G03B 2/754 ;
U.S. Cl.
CPC ...
G03B 2/752 ; G03B 2/754 ;
Abstract
In a system for flushing at least one internal space of an objective, in particular an exposure projection objective for semiconductor lithography, flushing is performed by mixing at least two inert gasses in such a way that the refractive index resulting therefrom corresponds at least approximately to the refractive index of air.