The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6821906 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 23, 2004

Filed:

Nov. 20, 2001
Applicant:
Inventors:

Kenya Wada, Naka-gun, JP;

Kazuto Kinoshita, Naka-gun, JP;

Kazuhiko Gommori, Naka-gun, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/100 ; H05H 1/00 ; C23C 1/600 ;
U.S. Cl.
CPC ...
H01L 2/100 ; H05H 1/00 ; C23C 1/600 ;
Abstract

Method and apparatus for treating a surface of a substrate plate under irradiation of ultraviolet ray emitted from a dielectric barrier discharge lamp. Upon admission into a treating chamber, oxygen is removed from a treating surface and surrounding atmosphere of a substrate plate in order to suppress energy losses of ultraviolet ray to a minimum.


Find Patent Forward Citations

Wada, Kenya. (2004). Method and apparatus for treating surface of substrate plate (U.S. Patent No. 6821906). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6821906

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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