The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Jun. 04, 2002
Photomask, method for manufacturing the same and method for detecting/repairing defects in photomask
Applicant:
Inventor:
Yo-han Choi, Yongin, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ;
Abstract
A photomask includes a mask substrate formed of a transparent nonconductor, a plurality of opaque conductive patterns formed on the mask substrate and separated from one another, and one or more conductive lines for connecting one of the conductive patterns with at least one adjacent conductive patterns. Electric charges, which accumulate in conductive patterns when using a focused ion beam (FIB) system, are dispersed through the conductive lines. The contrast of images of photomask patterns is increased by dispersion of electric charges, thereby improving the images of photomask patterns.