The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Mar. 11, 2002
Hiroshi Takita, Kawasaki, JP;
Hiromi Hoshino, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A block mask making method is provided that can improve throughput of a process for exposing a semiconductor device having a plurality of layers. Steps S -S respectively extract blocks including basic figures included in layers of IC data. For example, step S extracts a block from a wiring layer, and step S extracts a block from a gate layer, step S extracting a block from a hole layer. In step S , if the number of blocks extracted by steps S -S is larger than the number of blocks that can be arranged on the block mask, blocks that are used frequently are selected preferentially. Step S determines arrangement of a block having a smaller exposure pattern closer to a center of the block mask. Data in which arrangement is fixed is output as block mask making data.