The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2004
Filed:
Dec. 10, 1999
Hideaki Sakurai, Saitama-ken, JP;
Yukiya Yamashita, Saitama-ken, JP;
Yoshirou Kuromitsu, Saitama-ken, JP;
Mitsubishi Materials Corporation, Tokyo, JP;
Abstract
The present invention provides a protecting film capable of preventing deterioration in adhesion and matching to a substrate (dielectric layer), and deterioration in electric insulation. The protecting film includes a film body composed of MgO or the like which is inhibited from reacting with CO gas and H O gas in air to prevent degeneration of MgO or the like into MgCO and Mg(OH) , etc. harmful to FPD. The film body is formed on the surface of the substrate, and the fluoride layer is formed on the surface of the film body. The fluoride layer is represented by MO F (M is Mg, Ca, Sr, Ba, an alkali earth complex metal, a rare earth metal, or a complex metal of an alkali earth metal and a rare earth metal, 0≦X<2, and 0<Y≦4), and is obtained by reaction of a gaseous fluorinating agent with MaO or the like. As the gaseous fluorinating agent, a fluorine gas, a hydrogen fluoride gas, BF , SbF or SF is preferably used.