The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 16, 2004
Filed:
Aug. 22, 2001
Applicant:
Inventor:
Yim Bun Patrick Kwan, Munich, DE;
Assignee:
ASML Netherland B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 1/100 ; G01B 9/00 ; G03B 2/754 ; G03B 2/732 ; G01N 2/186 ;
U.S. Cl.
CPC ...
G01B 1/100 ; G01B 9/00 ; G03B 2/754 ; G03B 2/732 ; G01N 2/186 ;
Abstract
The X, Y and Rx positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be co-planar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitative or optical height sensors.
Kwan, Yim Bun Patrick. (2004). Lithographic apparatus, device manufacturing method, and device manufactured thereby (U.S. Patent No. 6819425). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6819425
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile