The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6819405 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 16, 2004

Filed:

May. 03, 2002
Applicant:
Inventors:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/762 ; G03B 2/742 ;
U.S. Cl.
CPC ...
G03B 2/762 ; G03B 2/742 ;
Abstract

A lithographic projection apparatus including a first radiation system for providing a first projection beam of radiation; a second radiation system for providing a second projection beam of radiation; a support structure for supporting a first patterning structure and a second patterning structure, the first patterning structure serving to pattern the first projection beam according to a first pattern and the second patterning structure serving to pattern the second projection beam according to a second pattern; a substrate table for holding a substrate; a projection system for combining the first and second patterned beams and projecting the combined beam onto a target portion of the substrate.


Find Patent Forward Citations

Mulkens, Johannes Catharinus Hubertus. (2004). Lithographic apparatus, device manufacturing method, and device manufactured thereby (U.S. Patent No. 6819405). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6819405

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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