The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 09, 2004
Filed:
Jul. 17, 2002
Motion feed-through into a vacuum chamber and its application in lithographic projection apparatuses
Applicant:
Inventors:
Theodorus H. J. Bisschops, Eindhoven, NL;
Jakob Vijfvinkel, Eindhoven, NL;
Hermanus M. J. R. Soemers, Mierlo, NL;
Johannes C. Driessen, Eindhoven, NL;
Michael J. M. Renkens, Geleen, NL;
Adrianus G. Bouwer, Nuenen, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/758 ;
U.S. Cl.
CPC ...
G03B 2/758 ;
Abstract
A long-stroke movement is fed-through into a vacuum chamber by providing a sliding seal over an aperture in the vacuum chamber wall. The object to be moved, which may be a mask or wafer table in a lithographic apparatus, within the vacuum chamber is connected to or mounted on the sliding seal and moved by movement of the sliding seal. The sliding seal may be a plate, a bowl or a labyrinth of interleaved plates.