The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2004

Filed:

Oct. 04, 1999
Applicant:
Inventors:

Jerome Alieu, Isle d' Abeau, FR;

Christophe Lair, Brignoud, FR;

Michel Haond, Crolles, FR;

Assignee:

STMicroelectronics SA, Montrouge, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/176 ; H01L 2/14763 ; H01L 2/144 ; H01L 2/1461 ; H01L 2/131 ;
U.S. Cl.
CPC ...
H01L 2/176 ; H01L 2/14763 ; H01L 2/144 ; H01L 2/1461 ; H01L 2/131 ;
Abstract

The device and process include the deposition of polycrystalline germanium in the interconnect spaces between conductive metal elements. The device and process further include the removal of the germanium in order to form air-filled interconnect spaces.


Find Patent Forward Citations

Alieu, Jerome. (2004). Process for achieving intermetallic and/or intrametallic air isolation in an integrated circuit, and integrated circuit obtained (U.S. Patent No. 6812113). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6812113

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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