The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 02, 2004

Filed:

Nov. 08, 2002
Applicant:
Inventors:

Dieter M. Gruen, Downers Grove, IL (US);

Hans-Gerd Busmann, Bremen, DE;

Eva-Maria Meyer, Bremen, DE;

Orlando Auciello, Bolingbrook, IL (US);

Alan R. Krauss, late of Naperville, IL (US);

Assignee:

The University of Chicago, Chicago, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 2/304 ; C30B 2/904 ;
U.S. Cl.
CPC ...
C30B 2/304 ; C30B 2/904 ;
Abstract

MEMS structure and a method of fabricating them from ultrananocrystalline diamond films having average grain sizes of less than about 10 nm and feature resolution of less than about one micron . The MEMS structures are made by contacting carbon dimer species with an oxide substrate forming a carbide layer on the surface onto which ultrananocrystalline diamond having average grain sizes of less than about 10 nm is deposited. Thereafter, microfabrication process are used to form a structure of predetermined shape having a feature resolution of less than about one micron.


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